DEVELOPMENT OF ARC EVAPORATION OF NONSTOICHIOMETRIC TITANIUM NITRIDE COATINGS

被引：43
|
作者：
SUE, JA
机构：
[1] Praxair Surface Technologies Inc, Indianapolis, United States
来源：
SURFACE & COATINGS TECHNOLOGY | 1993年 / 61卷 / 1-3期
关键词：
D O I：
10.1016/0257-8972(93)90212-7
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
A family of non-stoichiometric TiN(x) (x < 1) coatings was deposited by the physical vapor deposition, arc evaporation process. The crystallographic orientation, crystallite size, microstrain, residual stress, microhardness and erosion resistance of the coatings were evaluated as a function of their N content. The erosion resistance of the coatings, which is strongly dependent on the crystallite size, residual stress and microhardness, was determined. The optimization of the N content in the coating for erosion performance is discussed.
引用
收藏
页码：115 / 120
页数：6
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