EFFECT OF CO ON THE LOW-TEMPERATURE DIFFUSION OF CR AND SI THROUGH THIN GOLD-FILMS

被引：33
|
作者：
CHANG, CA
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1980年 / 127卷 / 06期
关键词：
D O I：
10.1149/1.2129894
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：1331 / 1334
页数：4
相关论文
共 50 条
  • [21] INFLUENCE OF EPITAXY ON THE LOW-TEMPERATURE SILICON DIFFUSION THROUGH GOLD LAYERS
    CROS, A
    DALLAPORTA, H
    OBERLIN, JC
    APPLIED SURFACE SCIENCE, 1992, 56-8 : 434 - 437
  • [22] THE LOW-TEMPERATURE DIFFUSION OF HYDROGEN THROUGH ANNEALED, QUENCHED AND AGED GOLD
    ISHIKAWA, T
    MCLELLAN, RB
    JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1985, 46 (12) : 1393 - 1396
  • [23] Low-temperature atomic layer deposition of MgO thin films on Si
    Vangelista, S.
    Mantovan, R.
    Lamperti, A.
    Tallarida, G.
    Kutrzeba-Kotowska, B.
    Spiga, S.
    Fanciulli, M.
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2013, 46 (48)
  • [24] Doping of Si thin films by low-temperature molecular beam epitaxy
    1600, (73):
  • [25] OUTDIFFUSION OF SI THROUGH GOLD-FILMS - THE EFFECTS OF SI ORIENTATION, GOLD DEPOSITION TECHNIQUES AND RATES, AND ANNEALING AMBIENTS
    CHANG, CA
    OTTAVIANI, G
    APPLIED PHYSICS LETTERS, 1984, 44 (09) : 901 - 903
  • [26] BACKSCATTERING INVESTIGATION OF LOW-TEMPERATURE MIGRATION OF CHROMIUM THROUGH GOLD FILMS
    HIRVONEN, JK
    WEISENBERGER, WH
    WESTMORELAND, JE
    MEUSSNER, RA
    APPLIED PHYSICS LETTERS, 1972, 21 (01) : 37 - +
  • [27] AN INVESTIGATION OF SILVER DIFFUSION THROUGH GOLD-FILMS BY AUGER-ELECTRON SPECTROSCOPY
    LIU, YY
    WANG, L
    ZHAN, JZ
    CHUI, L
    VACUUM, 1985, 35 (12) : 537 - 538
  • [28] Effect of gold layer thickness on the low-temperature crystallization process of germanium thin films by gold-induced crystallization
    Sunthornpan, Narin
    Tauchi, Kohtaroh
    Tezuka, Nairu
    Kyuno, Kentaro
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2020, 59 (08)
  • [29] Low-temperature Hall effect in bismuth chalcogenides thin films
    Kuntsevich, A. Yu
    Gabdullin, A. A.
    Prudkogliad, V. A.
    Selivanov, Yu G.
    Chizhevskii, E. G.
    Pudalov, V. M.
    PHYSICAL REVIEW B, 2016, 94 (23)
  • [30] LOW TEMPERATURE DIFFUSION IN THIN FILMS
    TURNER, PA
    THEUERER, HC
    JOURNAL OF METALS, 1968, 20 (01): : A99 - &
12345