THE EFFECTS OF TITANIUM SILICIDE FORMATION ON DOPANT REDISTRIBUTION

被引：0
|
作者：
BRAT, T
OSBURN, CM
SHARMA, D
CHU, WK
PARIKH, N
LIN, S
机构：
[1] MICROELECTR CTR N CAROLINA,RES TRIANGLE PK,NC 27709
[2] UNIV N CAROLINA,CHAPEL HILL,NC 27514
[3] N CAROLINA STATE UNIV,RALEIGH,NC 27695
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1987年 / 134卷 / 03期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：C120 / C120
页数：1
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