Van Der Waals forces in Helium

被引：17
|
作者：
Page, CH [1 ]
机构：
[1] Yale Univ, Sloane Phys Lab, New Haven, CT USA
来源：
PHYSICAL REVIEW | 1938年 / 53卷 / 05期
关键词：
D O I：
10.1103/PhysRev.53.426
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
引用
收藏
页码：426 / 430
页数：5
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