CATHODE SIDE MODEL OF LOW-PRESSURE HG - A ARC DISCHARGES WITH OXIDE COATED CATHODES

被引：0
|
作者：
BITO, JF
机构：
来源：
ACTA TECHNICA ACADEMIAE SCIENTIARUM HUNGARICAE | 1969年 / 65卷 / 1-2期
关键词：
D O I：
暂无
中图分类号：
P3 [地球物理学]; P59 [地球化学];
学科分类号：
0708 ; 070902 ;
摘要：
引用
收藏
页码：197 / &
相关论文
共 50 条
  • [41] STABILIZATION OF LOW-PRESSURE ARC DISCHARGES FOR UV HIGH-POWER LASER
    LUTHI, HR
    SEELIG, W
    ZEITSCHRIFT FUR ANGEWANDTE MATHEMATIK UND PHYSIK, 1977, 28 (06): : 1168 - 1172
  • [42] Global model of instabilities in low-pressure inductive chlorine discharges
    Despiau-Pujo, E.
    Chabert, P.
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2009, 18 (04):
  • [43] ANALYTICAL MODEL FOR LOW-PRESSURE MERCURY + INERT GAS DISCHARGES
    LAMA, WL
    GALLO, CF
    HAMMOND, TJ
    WALSH, PJ
    BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, 1977, 22 (02): : 200 - 201
  • [44] SWITCHING MODEL OF ARC ROOT INITIATION ON OXIDE-COATED COLD CATHODES
    MORGAN, DV
    ELECTRONICS LETTERS, 1976, 12 (18) : 454 - 456
  • [45] Sheath formation in low-pressure discharges
    Valentini, HB
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2000, 9 (04): : 574 - 582
  • [46] Relation between surface roughness and number of cathode spots of a low-pressure arc
    Sato, Atsushi
    Iwao, Toru
    Yumoto, Motoshige
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2008, 17 (04):
  • [47] LOW-PRESSURE GAS DISCHARGES.
    Polman, J.
    van Tongeren, H.
    Verbeek, T.G.
    Philips Technical Review, 1975, 35 (11-12): : 321 - 330
  • [48] WALL RECOMBINATION IN LOW-PRESSURE DISCHARGES
    EMELEUS, KG
    COULTER, JRM
    INTERNATIONAL JOURNAL OF ELECTRONICS, 1985, 59 (01) : 65 - 69
  • [49] Surface area of oxide coated cathodes by adsorption of gas at low pressure
    Wooten, LA
    Brown, C
    JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1943, 65 : 113 - 118
  • [50] Cathode-fall development in low-pressure, parallel-plane hydrogen discharges
    Phys Rev E., 2 (1852):
12345