VARIABLE-SHAPED ELECTRON-BEAM DIRECT WRITING TECHNOLOGY FOR 1-MU-M VLSI FABRICATION

被引：17
|
作者：
SAKAKIBARA, Y
OGAWA, T
KOMATSU, K
MORIYA, S
KOBAYASHI, M
KOBAYASHI, T
机构：
来源：
IEEE TRANSACTIONS ON ELECTRON DEVICES | 1981年 / 28卷 / 11期
关键词：
D O I：
10.1109/T-ED.1981.20600
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：1279 / 1284
页数：6
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