INTERNAL-STRESS IN THIN EPITAXIAL ELECTRODEPOSITS PRODUCED BY LATTICE MISFIT AND CRYSTALLINE COALESCENCE

被引：0

作者：

FEIGENBAUM, H ^{[1
]}

RAO, ST ^{[1
]}

WEIL, R ^{[1
]}

机构：

[1] STEVENS INST TECHNOL,DEPT MAT & MET ENGN,HOBOKEN,NJ 07030

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1980年 / 127卷 / 08期

关键词：

D O I：

暂无

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：C383 / C383

页数：1

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