INTERNAL-STRESS IN THIN EPITAXIAL ELECTRODEPOSITS PRODUCED BY LATTICE MISFIT AND CRYSTALLINE COALESCENCE

被引：0
|
作者：
FEIGENBAUM, H [1 ]
RAO, ST [1 ]
WEIL, R [1 ]
机构：
[1] STEVENS INST TECHNOL,DEPT MAT & MET ENGN,HOBOKEN,NJ 07030
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1980年 / 127卷 / 08期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
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页码：C383 / C383
页数：1
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