ELECTRICAL-CONDUCTIVITY, DEFECT DENSITY AND STRUCTURE OF OBLIQUELY VACUUM-DEPOSITED TIN ANTIMONIDE ALLOY THIN-FILMS

被引：1
|
作者：
DAS, VD
JAGADEESH, MS
机构：
来源：
JOURNAL OF MATERIALS SCIENCE | 1982年 / 17卷 / 03期
关键词：
D O I：
10.1007/BF00540363
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
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页码：671 / 676
页数：6
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