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HYDROGEN RECYCLING IN CARBON-FILMS
被引:2
|
作者
:
MICHIZONO, S
论文数:
0
引用数:
0
h-index:
0
机构:
Department of Applied Physics, The University of Tokyo, 113 Tokyo, Bunkyo
MICHIZONO, S
BANNO, T
论文数:
0
引用数:
0
h-index:
0
机构:
Department of Applied Physics, The University of Tokyo, 113 Tokyo, Bunkyo
BANNO, T
KINBARA, A
论文数:
0
引用数:
0
h-index:
0
机构:
Department of Applied Physics, The University of Tokyo, 113 Tokyo, Bunkyo
KINBARA, A
机构
:
[1]
Department of Applied Physics, The University of Tokyo, 113 Tokyo, Bunkyo
来源
:
VACUUM
|
1990年
/ 41卷
/ 4-6期
关键词
:
D O I
:
10.1016/0042-207X(90)94002-8
中图分类号
:
T [工业技术];
学科分类号
:
08 ;
摘要
:
Amorphous carbon films (∼40 nm thick) were prepared on the wall of a discharge vessel using methane plasma CVD. The films were exposed to a hydrogen and helium glow discharge. The hydrogen recycling phenomena in these films have been investigated. Measurements of the pressure change induced by the discharge allow the evaluation of hydrogen retention, and of hydrogen release. It has been found that the recycling depends on the wall temperature and on the energy of the hydrogen ions. The results are consistently interpreted in terms of a Desorbable-phase model) (D-phase moddl) with consideration of the dependence of the hydrogen depth profile in the films on the incident energy of the ions. © 1990.
引用
收藏
页码:1493 / 1496
页数:4
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