PROPOSAL FOR A NEW SUB-MICRON DIMENSION REFERENCE FOR AN ELECTRON-BEAM METROLOGY SYSTEM

被引：48
|
作者：
NAKAYAMA, Y [1 ]
OKAZAKI, S [1 ]
SUGIMOTO, A [1 ]
机构：
[1] HITACHI LTD,MUSASHI WORKS,KODAIRA,TOKYO 187,JAPAN
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 06期
关键词：
D O I：
10.1116/1.584135
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：1930 / 1933
页数：4
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