ELECTRON-OPTICAL PERFORMANCE OF ELECTRON-BEAM LITHOGRAPHY COLUMNS PREDICTED BY A SIMPLE-MODEL

被引:1
|
作者
LANGNER, G
STICKEL, W
机构
来源
关键词
D O I
10.1116/1.584704
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:98 / 103
页数:6
相关论文
共 50 条
  • [31] LSI AND ELECTRON-BEAM LITHOGRAPHY
    LIVESAY, WR
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1975, 122 (03) : C86 - C86
  • [32] FAST ELECTRON-BEAM LITHOGRAPHY
    EIDSON, JC
    IEEE SPECTRUM, 1981, 18 (07) : 24 - 28
  • [33] ELECTRON-BEAM LITHOGRAPHY IN TELECOMMUNICATIONS DEVICE FABRICATION .1. ELECTRON-BEAM LITHOGRAPHY MACHINES
    JONES, ME
    DIX, C
    BRITISH TELECOM TECHNOLOGY JOURNAL, 1989, 7 (01): : 25 - 43
  • [34] Performance of the Raith 150 electron-beam lithography system
    Goodberlet, JG
    Hastings, JT
    Smith, HI
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2001, 19 (06): : 2499 - 2503
  • [35] Electron-beam lithography: Resist requirements and performance.
    Liddle, JA
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2001, 222 : U248 - U248
  • [36] Effect of misalignment of electron-optical system of accumulative electron-beam tools on the signal value
    Lavrinovich, NA
    IZVESTIYA VYSSHIKH UCHEBNYKH ZAVEDENII RADIOELEKTRONIKA, 1996, 39 (3-4): : A36 - A43
  • [37] Digital pattern generator: an electron-optical MEMS for massively parallel reflective electron beam lithography
    Grella, Luca
    Carroll, Allen
    Murray, Kirk
    McCord, Mark A.
    Tong, William M.
    Brodie, Alan D.
    Gubiotti, Thomas
    Sun, Fuge
    Kidwingira, Francoise
    Kojima, Shinichi
    Petric, Paul
    Bevis, Christopher F.
    Vereecke, Bart
    Haspeslagh, Luc
    Mane, Anil U.
    Elam, Jeffrey W.
    JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2013, 12 (03):
  • [38] Tolerancing of electron beam lithography columns
    Liu, H.
    Zhu, X.
    Munro, E.
    Rouse, J.A.
    Microelectronic Engineering, 1998, 41-42 : 163 - 166
  • [39] Tolerancing of electron beam lithography columns
    Liu, H
    Zhu, X
    Munro, E
    Rouse, JA
    MICROELECTRONIC ENGINEERING, 1998, 42 : 163 - 166
  • [40] OPTICAL AND ELECTRON-BEAM LITHOGRAPHY FOR ELECTROLESS COPPER MULTILEVEL METALLIZATION
    SHACHAMDIAMAND, Y
    ANGYAL, M
    DEDHIA, A
    NASIR, Q
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1992, 10 (06): : 2958 - 2961