MICROTECHNICAL APPLICATIONS OF DEEP-ETCH PHOTOLITHOGRAPHY USING UV AND SYNCHROTRON-RADIATION

The tremendous advances of microtechniques during the last decade are consecutive to technology transfer from microelectronics to mechanics and optics. Many microfabrication techniques have been developed, principally based on lithography processes. Among these techniques, some are devoted to the manufacturing of deep mold inserts (from 10 mu to 1 mm thick) perfectly defined in the plane of the lithography (resolution similar or equal to 1 mu m, submicron precision). These mold inserts are obtained by combining these lithography techniques and electroforming processes. The present paper will discribe the principle of these new technologies and will present attractive results obtained by the different research groups working in this topic.