PROPERTIES OF ALL-NB THIN-FILM MICROBRIDGES FABRICATED BY NANOMETER PROCESS

被引：2
|
作者：
HARADA, Y [1 ]
HIROSE, N [1 ]
UZAWA, Y [1 ]
SEKINE, M [1 ]
YOSHIMORI, S [1 ]
KAWAMURA, M [1 ]
机构：
[1] TAKUSHOKU UNIV,FAC ENGN,HACHIOJI,TOKYO 193,JAPAN
来源：
PHYSICA C | 1991年 / 185卷 / pt 4期
关键词：
Microbridges - Nanometer Processes;
D O I：
10.1016/0921-4534(91)91401-O
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
We have fabricated all-Nb thin film microbridges by using newly developed nanometer process. These microbridges show the high sensitivity of the radiation detection. We have investigated the properties of microbridges by changing the bridge-region parameters.
引用
收藏
页码：2555 / 2556
页数：2
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