AN ULTRAHIGH VACUUM CRYOSTAT FOR CLEAN SURFACE STUDIES OF HIGH RESISTIVITY PHOTOCONDUCTIVE MATERIALS

被引：1
|
作者：
ARCH, M
REED, CE
SCOTT, CG
机构：
来源：
VACUUM | 1969年 / 19卷 / 09期
关键词：
D O I：
10.1016/S0042-207X(69)91459-6
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：403 / +
页数：1
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