MEASUREMENTS OF PLASMA CONTROLLED BY COMPRESSED MAGNETIC-FIELD MAGNETRON SPUTTERING TECHNIQUE

被引：11
|
作者：
IDO, S [1 ]
ISHIDA, Y [1 ]
HIJIKATA, K [1 ]
机构：
[1] MITSUBISHI MAT CORP,CENT RES INST,1-297 KITABUKURO CHO,OMIYA,SAITAMA 330,JAPAN
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1993年 / 32卷 / 5A期
关键词：
SPUTTERING; MAGNETRON; EROSION; COMPRESSED MAGNETIC FIELD; DRIFT; ELECTRON DENSITY; MEASUREMENTS;
D O I：
10.1143/JJAP.32.2112
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Measurements of the electron density of plasma and the magnetic field were carried out in a compressed magnetic field-magnetron sputtering system using a non-ferromagnetic material target. The electron density has its maximum in the region where the lines of magnetic force are parallel to the target surface, where the peak of erosion profile is observed. It was found that the peak position of the profiles of electron density and erosion could be controlled using this system.
引用
收藏
页码：2112 / 2115
页数：4
相关论文
共 50 条
  • [31] PROBE TECHNIQUE FOR DETERMINING SPACE POTENTIAL IN PLASMA IN A MAGNETIC-FIELD
    BUGROVA, AI
    VERSOTSKII, VS
    DESYATSKOV, AV
    INSTRUMENTS AND EXPERIMENTAL TECHNIQUES, 1992, 35 (03) : 501 - 505
  • [32] FABRICATION OF SUPERLATTICE STRUCTURES BY PLASMA CONTROLLED MAGNETRON SPUTTERING
    HATA, T
    KAMIYA, K
    KAMIDE, Y
    HORITA, S
    THIN SOLID FILMS, 1988, 163 : 467 - 473
  • [33] Experimental Study of the Effect of Applied Magnetic Field on Plasma Properties of Unbalanced Magnetron Sputtering
    牟宗信
    王春
    牟晓东
    贾莉
    刘升光
    董闯
    Plasma Science and Technology, 2010, 12 (05) : 571 - 576
  • [34] Experimental Study of the Effect of Applied Magnetic Field on Plasma Properties of Unbalanced Magnetron Sputtering
    Mu Zongxin
    Wang Chun
    Mu Xiaodong
    Jia Li
    Liu Shengguang
    Dong Chuang
    PLASMA SCIENCE & TECHNOLOGY, 2010, 12 (05) : 571 - 576
  • [35] Experimental Study of the Effect of Applied Magnetic Field on Plasma Properties of Unbalanced Magnetron Sputtering
    牟宗信
    王春
    牟晓东
    贾莉
    刘升光
    董闯
    Plasma Science and Technology, 2010, (05) : 571 - 576
  • [36] MEASUREMENTS OF MAGNETIC-FIELD ALIGNMENT
    KUCHNIR, M
    SCHMIDT, EE
    IEEE TRANSACTIONS ON MAGNETICS, 1988, 24 (02) : 950 - 953
  • [37] MAGNETIC-FIELD MEASUREMENTS FOR ISX
    NAVARRO, AP
    COLCHIN, RJ
    JERNIGAN, TC
    MCNEILL, DH
    WING, WR
    BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, 1977, 22 (09): : 1157 - 1157
  • [38] MAGNETIC-FIELD MEASUREMENTS IN IHX
    JARBOE, TR
    HENINS, I
    SHERWOOD, AR
    BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, 1976, 21 (09): : 1074 - 1074
  • [39] PREPARING MAGNETIC-FIELD MEASUREMENTS
    FRUHWIRTH, R
    COMPUTER PHYSICS COMMUNICATIONS, 1981, 22 (2-3) : 223 - 229
  • [40] Magnetic-field measurements using an integrated resonant magnetic-field sensor
    Kadar, Z
    Bossche, A
    Sarro, PM
    Mollinger, JR
    SENSORS AND ACTUATORS A-PHYSICAL, 1998, 70 (03) : 225 - 232
12345