DIFFUSION OF ARSENIC IN POLYCRYSTALLINE SILICON

被引：77

作者：

SWAMINATHAN, B ^{[1
]}

SARASWAT, KC ^{[1
]}

DUTTON, RW ^{[1
]}

KAMINS, TI ^{[1
]}

机构：

[1] HEWLETT PACKARD LABS,PALO ALTO,CA 94304

来源：

APPLIED PHYSICS LETTERS | 1982年 / 40卷 / 09期

关键词：

D O I：

10.1063/1.93263

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：795 / 798

页数：4

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