EFFECT OF SUBSTRATE-TEMPERATURE ON THE PROPERTIES OF ZRO2 FILMS PREPARED BY DC REACTIVE MAGNETRON SPUTTERING

被引:12
|
作者
SUHAIL, MH
RAO, GM
MOHAN, S
机构
[1] Instrumentation and Services Unit, Indian Institute of Science, Bangalore
来源
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY | 1992年 / 12卷 / 03期
关键词
D O I
10.1016/0921-5107(92)90295-K
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Studies of ZrO2 films prepared by d.c. reactive magnetron sputtering are described. The effects of substrate temperature on the packing density, refractive index, extinction coefficient and crystallinity phase have been investigated in the temperature range 25-450-degrees-C. The refractive index varied from 1.84 to 1.95 and extinction coefficient from 2 x 10(-3) to 9.6 x 10(-3). This was explained on the basis of an increase in packing density from 0.686 to 0.813. The change in packing density has been attributed to a decrease in the oxygen condensation at higher temperatures. Annealing results in a decrease in refractive index and increase in extinction coefficient. The films deposited at 150-degrees-C showed a monoclinic phase which transforms to a tetragonal phase at higher substrate temperatures.
引用
收藏
页码:247 / 252
页数:6
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