CRITICAL SCATTERING OF CONDUCTION ELECTRONS AROUND THE NEEL TEMPERATURE OF ALPHA-MANGANESE THIN-FILMS

被引：7
|
作者：
BOAKYE, F
ADANU, KG
GRASSIE, ADC
机构：
[1] UNIV GHANA,DEPT PHYS,LEGON,GHANA
[2] UNIV SUSSEX,DIV PHYS,BRIGHTON BN1 9QN,E SUSSEX,ENGLAND
来源：
MATERIALS LETTERS | 1994年 / 18卷 / 5-6期
关键词：
D O I：
10.1016/0167-577X(94)90016-7
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The critical scattering of conduction electrons in the neighbourhood of the Neel temperature of Mn thin films has been studied using our resistivity-temperature curves. The Neel temperature of alpha-Mn thin films has been established as 90 +/- 1 K and an analysis of the resistivity results near the Neel temperature gave critical exponents which are in moderate agreement with existing theories.
引用
收藏
页码：320 / 326
页数：7
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