MECHANISM OF THE Y/SI INTERFACE FORMATION STUDIED BY PHOTOEMISSION

被引：23
|
作者：
PELLISSIER, A [1 ]
BAPTIST, R [1 ]
CHAUVET, G [1 ]
机构：
[1] CEN,PSC,DEPT RECH FONDAMENTALE,SERV PHYS,F-38041 GRENOBLE,FRANCE
来源：
SURFACE SCIENCE | 1989年 / 210卷 / 1-2期
关键词：
D O I：
10.1016/0039-6028(89)90105-2
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
引用
收藏
页码：99 / 113
页数：15
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