ELECTRON BEAM EXPOSURE SYSTEM FOR INTEGRATED CIRCUITS

被引：12
|
作者：
TARUI, Y
DENDA, S
BABA, H
MIYAUCHI, S
TANAKA, K
机构：
来源：
MICROELECTRONICS RELIABILITY | 1969年 / 8卷 / 02期
关键词：
D O I：
10.1016/0026-2714(69)90206-6
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：101 / &
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