ELECTRON BEAM EXPOSURE SYSTEM FOR INTEGRATED CIRCUITS

被引：12

|

作者：

TARUI, Y

DENDA, S

BABA, H

MIYAUCHI, S

TANAKA, K

机构：

来源：

MICROELECTRONICS RELIABILITY | 1969年 / 8卷 / 02期

关键词：

D O I：

10.1016/0026-2714(69)90206-6

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

收藏

页码：101 / &

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