HIGH-TEMPERATURE SUPERCONDUCTING FILMS BY RF MAGNETRON SPUTTERING

被引:20
|
作者
KADIN, AM [1 ]
BALLENTINE, PH [1 ]
ARGANA, J [1 ]
RATH, RC [1 ]
机构
[1] CVC PROD INC,ROCHESTER,NY 14603
关键词
D O I
10.1109/20.92799
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:2437 / 2440
页数:4
相关论文
共 50 条
  • [41] Influence of working gas pressure on the properties of thin films of high-temperature superconductors obtained by magnetron sputtering
    Vorob'ev, AK
    Gaponov, SV
    Gusev, SA
    Drozdov, YN
    Klyuenkov, EB
    Luchin, VI
    TECHNICAL PHYSICS LETTERS, 1998, 24 (02) : 159 - 161
  • [43] Technology of high-temperature superconducting films and devices
    HIGH-TEMPERATURE-SUPERCONDUCTOR THIN FILMS AT MICROWAVE FREQUENCIES, 1999, 155 : 239 - +
  • [44] InN Thin Films Deposition by rf Magnetron Sputtering
    Braic, Mariana T.
    Zoita, Catalin N.
    Braic, Viorel T.
    Toacsan, Mariana I.
    Ioachim, Andrei T.
    2008 33RD INTERNATIONAL CONFERENCE ON INFRARED, MILLIMETER AND TERAHERTZ WAVES, VOLS 1 AND 2, 2008, : 709 - +
  • [45] Properties of ITO films prepared by rf magnetron sputtering
    El Akkad, F.
    Punnoose, A.
    Prabu, G.
    Applied Physics A: Materials Science and Processing, 2000, 71 (02): : 157 - 160
  • [46] Influence of working gas pressure on the properties of thin films of high-temperature superconductors obtained by magnetron sputtering
    A. K. Vorob’ev
    S. V. Gaponov
    S. A. Gusev
    Yu. N. Drozdov
    E. B. Klyuenkov
    V. I. Luchin
    Technical Physics Letters, 1998, 24 : 159 - 161
  • [47] SYNTHESIS OF TUNGSTEN CARBIDE FILMS BY RF MAGNETRON SPUTTERING
    SRIVASTAVA, PK
    RAO, TV
    VANKAR, VD
    CHOPRA, KL
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1984, 2 (03): : 1261 - 1265
  • [48] Textured ZnO thin films by RF magnetron sputtering
    Ginting, M
    Lee, JC
    Kang, KH
    Kim, SK
    Yoon, KH
    Park, IJ
    Song, JS
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 1999, 34 : S343 - S346
  • [49] RF MAGNETRON SPUTTERING DEPOSITION OF AZO THIN FILMS
    Chitanu, Elena
    Barros, Raquel
    Ionita, Gheorghe
    Martins, Rodrigo
    Fortunato, Elvira
    METALURGIA INTERNATIONAL, 2011, 16 (12): : 32 - 35
  • [50] Properties of ITO films prepared by rf magnetron sputtering
    F. El Akkad
    A. Punnoose
    G. Prabu
    Applied Physics A, 2000, 71 (2) : 157 - 160