X-RAY-LITHOGRAPHY

被引：76

作者：

HEUBERGER, A ^{[1
]}

机构：

[1] TECH UNIV BERLIN,D-1000 BERLIN 12,FED REP GER

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 01期

关键词：

D O I：

10.1116/1.584026

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：107 / 121

页数：15

共 50 条

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[32] X-RAY-LITHOGRAPHY - CAN IT BE JUSTIFIED
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