Al2O3+TiO2 THIN FILM MADE BY ELECTROSTATIC SPRAY DEPOSITION

被引:1
|
作者
Krella, A. K. [1 ]
Krupa, A. [1 ]
Sobczyk, A. T. [1 ]
Jaworek, A. [1 ]
机构
[1] Polish Acad Sci, Inst Fluid Flow Machinery, Fiszera 14, PL-80231 Gdansk, Poland
来源
ADVANCES IN MATERIALS SCIENCE | 2016年 / 16卷 / 03期
关键词
ceramic coatings; thin film; fracture; electrostatic spray deposition;
D O I
10.1515/adms-2016-0016
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In this work electrostatic spray deposition process was used to deposit thin Al2O3 + TiO2 ceramic thin film on X10CrAlSi18 steel from colloidal suspension of TiO2 powder in Al2O3 precursor solution. The precursor was 3% solution of Al-2(NO3)(3) in ethanol. An influence of the thermal treatment after film deposition on protective properties against high temperatures and film endurance were investigated. The resistance against thermal cycles and dynamic impacts were tested. Performed investigations showed that the best protective properties had the Al2O3 + TiO2 film sintered at 1000 degrees C.
引用
收藏
页码:47 / 55
页数:9
相关论文
共 50 条
  • [21] Tribocorrosion behavior of TiO2/Al2O3 nanolaminate, Al2O3, and TiO2 thin films produced by atomic layer deposition
    Radi, Polyana Alves
    Testoni, Giorgio Ernesto
    Pessoa, Rodrigo Savio
    Maciel, Homero Santiago
    Rocha, Luis Augusto
    Vieira, Lucia
    SURFACE & COATINGS TECHNOLOGY, 2018, 349 : 1077 - 1082
  • [22] Nanolaminated Al2O3-TiO2 thin films grown by atomic layer deposition
    Kim, YS
    Yun, SJ
    JOURNAL OF CRYSTAL GROWTH, 2005, 274 (3-4) : 585 - 593
  • [23] Atomic layer deposition of TiO2 and Al2O3 thin films and nanolaminates
    Mitchell, DRG
    Triani, G
    Attard, DJ
    Finnie, KS
    Evans, PJ
    Barbé, CJ
    Bartlett, JR
    SMART MATERIALS AND STRUCTURES, 2006, 15 (01) : S57 - S64
  • [24] Electrostatic sol-spray deposition (ESSD) and characterisation of nanostructured TiO2 thin films
    Chen, CH
    Kelder, EM
    Schoonman, J
    THIN SOLID FILMS, 1999, 342 (1-2) : 35 - 41
  • [25] Electrostatic sol-spray deposition (ESSD) and characterization of nanostructured TiO2 thin films
    Chen, C.H.
    Kelder, E.M.
    Schoonman, J.
    Thin Solid Films, 1999, 342 (01): : 35 - 41
  • [26] 等离子喷涂Al2O3+TiO2复合陶瓷涂层的组织结构
    陈传忠
    李士同
    王曙光
    陈鹭滨
    彭其风
    于家洪
    雷廷权
    陶瓷学报, 1999, (01) : 20 - 25
  • [27] Growth of γ-In2Se3 Thin Films by Electrostatic Spray Pyrolysis Deposition
    Kato, Takamasa
    Hiramatsu, Toshitaka
    Onojima, Norio
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2011, 50 (05)
  • [28] Al2O3 THIN FILM DEPOSITION USING THERMIONIC VACUUM ARC
    Akan, Tamer
    Karakas, Erdinc
    Musa, Geavit
    SIGMA JOURNAL OF ENGINEERING AND NATURAL SCIENCES-SIGMA MUHENDISLIK VE FEN BILIMLERI DERGISI, 2005, 23 (03): : 18 - 23
  • [29] Formation and growing of TiO2 nanometer thin film on Al2O3 substrate
    Du, HY
    Xu, MX
    Xu, TX
    RARE METAL MATERIALS AND ENGINEERING, 2002, 31 : 349 - 352
  • [30] Deposition of alumina thin film by dual magnetron sputtering: Is it γ-Al2O3?
    Engelhart, W.
    Dreher, W.
    Eibl, O.
    Schier, V.
    ACTA MATERIALIA, 2011, 59 (20) : 7757 - 7767