CHARACTERIZATION OF MIRROR-POLISHED SILICON-WAFERS BY MAKYOH METHOD

被引:12
|
作者
TOKURA, S
FUJINO, N
NINOMIYA, M
MASUDA, K
机构
[1] Kyushu Electronic Metal Co., Ltd., Kishima-gun, Saga, 849-05, Kouhoku
关键词
D O I
10.1016/0022-0248(90)90223-8
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Makyoh, the "Magic Mirror" is a very useful tool with which to visualize local irregularities of the surface of a mirror-like polished silicon wafer. Using the Makyoh method, bright and dark spots are visible in the image of wafers projected on an instrument screen. However, these spots have not yet been correlated to specific defects on a wafer surface. First, local convex-type defects on the mirror-like surface of silicon wafers are observed with Makyoh, a flatness tester and other micro surface measurement systems. Next, we report our attempts to create actrual convex and concave shapes on silicon wafer surfaces by intentionally varying polishing conditions, and which shapes are observed. We also discuss the relationship between silicon wafer flatness and the Makyoh magic mirror image. © 1990.
引用
收藏
页码:437 / 442
页数:6
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