CORRELATION OF VERY THIN SILICON DIOXIDE QUALITY WITH HAZE ON POLISHED SILICON-WAFERS

被引：0
|
作者：
TU, H [1 ]
ZHANG, C [1 ]
XONG, D [1 ]
WAN, Q [1 ]
XU, X [1 ]
机构：
[1] GEN RES INST NONFERROUS MET,BEIJING,PEOPLES R CHINA
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1987年 / 134卷 / 03期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：C125 / C125
页数：1
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