LASERS IN CHEMICAL VAPOR-DEPOSITION

被引：0

|

作者：

不详

机构：

来源：

SOLID STATE TECHNOLOGY | 1973年 / 16卷 / 07期

关键词：

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

收藏

页码：12 / 12

页数：1

相关论文

共 50 条

[31] LASER CHEMICAL VAPOR-DEPOSITION
ROY, SK
BULLETIN OF MATERIALS SCIENCE, 1988, 11 (2-3) : 129 - 135
[32] MATERIALS AND PROCESSES FOR PREFORM FABRICATION - MODIFIED CHEMICAL VAPOR-DEPOSITION AND PLASMA CHEMICAL VAPOR-DEPOSITION
MACCHESNEY, JB
PROCEEDINGS OF THE IEEE, 1980, 68 (10) : 1181 - 1184
[33] CVD VS PVD (CHEMICAL VAPOR-DEPOSITION VS PHYSICAL VAPOR-DEPOSITION)
PODOB, M
HEAT TREATMENT OF METALS, 1985, 12 (01): : 9 - 9
[34] PROPERTIES OF METAL ORGANIC-CHEMICAL VAPOR-DEPOSITION DIODE-LASERS
STREIFER, W
SCIFRES, DR
BURNHAM, RD
JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1981, 71 (12) : 1558 - 1558
[35] ALGAAS-GAAS LASERS GROWN BY METALORGANIC CHEMICAL VAPOR-DEPOSITION - A REVIEW
DUPUIS, RD
JOURNAL OF CRYSTAL GROWTH, 1981, 55 (01) : 213 - 222
[36] EFFECTS OF ORDERING ON THE OPERATION OF ALGAINP LASERS GROWN BY METALORGANIC CHEMICAL VAPOR-DEPOSITION
NAKANO, K
TODA, A
YAMAMOTO, T
ISHIBASHI, A
APPLIED PHYSICS LETTERS, 1992, 61 (16) : 1959 - 1961
[37] ALTERNATIVE CHEMICAL PATHWAYS FOR CHEMICAL VAPOR-DEPOSITION
SAWIN, HH
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1985, 132 (08) : C354 - C354
[38] CHEMICAL VAPOR-DEPOSITION AND PHYSICAL VAPOR-DEPOSITION COATINGS - PROPERTIES, TRIBOLOGICAL BEHAVIOR, AND APPLICATIONS
HABIG, KH
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (06): : 2832 - 2843
[39] CHEMICAL VAPOR-DEPOSITION OF TANTALUM DISILICIDE
WIECZOREK, C
THIN SOLID FILMS, 1985, 126 (3-4) : 227 - 232
[40] APPLICATIONS FOR LASER CHEMICAL VAPOR-DEPOSITION
ALLEN, SD
JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1979, 69 (10) : 1461 - 1461

← 1 2 3 4 5 →