MICRODISTORTION MEASUREMENT IN AU TEXTURED THIN-FILMS BY X-RAY-DIFFRACTION

被引：19

作者：

DURAND, N

BIMBAULT, L

BADAWI, KF

GOUDEAU, P

机构：

来源：

JOURNAL DE PHYSIQUE III | 1994年 / 4卷 / 06期

关键词：

D O I：

10.1051/jp3:1994183

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Microdistorsion analysis in Au 150 nm thin films is presented in this study. Applying the method of the << integral width >>, known and employed in bulk materials, we have shown its feasibility and its interest in the case of thin films. Furthermore, in relation with X-Ray diffraction stress measurement. we found important effects of the deposition conditions on the films microstructure.

引用

页码：1025 / 1032

页数：8

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