XPS study of ultrathin carbon films prepared by filtered cathodic vacuum arc

被引:6
|
作者
Yasui, Nobuto [1 ]
Inaba, Hiroshi [1 ]
Sasaki, Shinji [1 ]
机构
[1] Hitachi Ltd, Cent Res Lab, Totsuka Ku, 292 Yoshida Cho, Yokohama, Kanagawa, Japan
关键词
Photoelectron spectroscopy; Ion-solid interaction; Carbon;
D O I
10.1380/ejssnt.2006.129
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Diamond like carbon (DLC) films have attracted increasing attention in a variety of industries due to their excellent mechanical and chemical properties. To meet the demands from the emerging industries, such as micro electro mechanical systems (MEMS), a considerable number of research studies have been conducted to advance the technology for thin DLC films fabrication. However, it has been reported that the properties of DLC films vary with thickness, which necessitate further understanding of the mechanism of initial film growth. To elucidate the mechanism of carbon film growth, the present study employs X-ray photoelectron spectroscopy (XPS) to characterize two types of amorphous carbon films fabricated by cathodic vacuum arc discharge and radio-frequency magnetron sputtering. The results indicated that wide range of energy distribution of carbon ions in the cathodic arc discharge caused a decline in the sp(3) ratio with decreasing thicknesses.
引用
收藏
页码:129 / 132
页数:4
相关论文
共 50 条
  • [31] Structural and electrical properties of copper thin films prepared by filtered cathodic vacuum arc technique
    Shi, JR
    Lau, SP
    Sun, Z
    Shi, X
    Tay, BK
    Tan, HS
    SURFACE & COATINGS TECHNOLOGY, 2001, 138 (2-3): : 250 - 255
  • [32] Optical properties of titania films prepared by off-plane filtered cathodic vacuum arc
    Zhao, ZW
    Tay, BK
    Lau, SP
    Yu, GQ
    JOURNAL OF CRYSTAL GROWTH, 2004, 268 (3-4) : 543 - 546
  • [33] Investigation of amorphous silicon-carbon films deposited by filtered vacuum cathodic arc
    Zhang, P
    Tan, WM
    Tay, BK
    SCIENCE AND TECHNOLOGY OF NANOMATERIALS - ICMAT 2003, 2005, 23 : 351 - 354
  • [34] Plasma diagnosis of tetrahedral amorphous carbon films by filtered cathodic vacuum arc deposition
    王明磊
    张林
    陆文琪
    林国强
    Plasma Science and Technology, 2023, 25 (06) : 101 - 107
  • [35] Tribological properties of tetrahedral carbon films deposited by filtered cathodic vacuum arc technique
    Shi, X
    Tay, BK
    Flynn, DI
    Sun, Z
    THIN FILMS: STRESSES AND MECHANICAL PROPERTIES VI, 1997, 436 : 293 - 298
  • [36] Raman studies of tetrahedral amorphous carbon films deposited by filtered cathodic vacuum arc
    Nanyang Technological Univ, Singapore, Singapore
    Surf Coat Technol, 1-2 (155-158):
  • [37] Plasma diagnosis of tetrahedral amorphous carbon films by filtered cathodic vacuum arc deposition
    Wang, Minglei
    Zhang, Lin
    Lu, Wenqi
    Lin, Guoqiang
    PLASMA SCIENCE & TECHNOLOGY, 2023, 25 (06)
  • [38] Plasma diagnosis of tetrahedral amorphous carbon films by filtered cathodic vacuum arc deposition
    王明磊
    张林
    陆文琪
    林国强
    Plasma Science and Technology, 2023, (06) : 101 - 107
  • [39] Raman studies of tetrahedral amorphous carbon films deposited by filtered cathodic vacuum arc
    Tay, BK
    Shi, X
    Tan, HS
    Yang, HS
    Sun, Z
    SURFACE & COATINGS TECHNOLOGY, 1998, 105 (1-2): : 155 - 158
  • [40] Spectroscopic ellipsometry studies of tetrahedral amorphous carbon prepared by filtered cathodic vacuum arc technique
    Xu, S
    Cheah, LK
    Tay, BK
    THIN SOLID FILMS, 1998, 312 (1-2) : 160 - 169