THE BEHAVIOR OF INCORPORATED IMPURITIES IN TANTALUM ANODIC OXIDE-FILMS AT THE DIELECTRIC-BREAKDOWN

被引：5
|
作者：
ARIFUKU, F
YONEYAMA, H
TAMURA, H
机构：
来源：
ELECTROCHIMICA ACTA | 1980年 / 25卷 / 06期
关键词：
D O I：
10.1016/0013-4686(80)90039-0
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：863 / 865
页数：3
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