THE BEHAVIOR OF INCORPORATED IMPURITIES IN TANTALUM ANODIC OXIDE-FILMS AT THE DIELECTRIC-BREAKDOWN

被引:5
|
作者
ARIFUKU, F
YONEYAMA, H
TAMURA, H
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关键词
D O I
10.1016/0013-4686(80)90039-0
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
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页码:863 / 865
页数:3
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