GROWTH-MECHANISM OF DIAMOND-LIKE AMORPHOUS-CARBON FILMS

被引：4
|
作者：
ZHANG, SX
CHENG, RG
机构：
[1] Shanghai Inst of Ceramics, China
来源：
JOURNAL OF NON-CRYSTALLINE SOLIDS | 1989年 / 112卷 / 1-3期
基金：
中国国家自然科学基金;
关键词：
Chemical Reactions--Hydrogenation - Films--Amorphous;
D O I：
10.1016/0022-3093(89)90513-9
中图分类号：
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
In situ optical emission spectra (OES) have proven to be an important diagnostic tool for monitoring the deposition process of diamond-like hydrogenated amorphous carbon (DL a-C:H) films from rf discharge decomposition of CH4 + Ar. The film deposition rate depends on the processing parameters, especially the self-bias between the electrodes. For our system, diamond-like hydrogenated amorphous carbon film growth is governed by a balance between the deposition and etching process. The implications of the results for the plasma and surface chemistry are discussed.
引用
收藏
页码：161 / 164
页数：4
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