THE MEASUREMENT OF INTERFACIAL STRESS USING THE PHOTOELASTIC EFFECT

被引：0
|
作者：
JACKSON, KH [1 ]
JONES, E [1 ]
HARRIS, GL [1 ]
SPENCER, MG [1 ]
机构：
[1] HOWARD UNIV,DEPT ELECT ENGN,WASHINGTON,DC 20059
来源：
JOURNAL OF ELECTRONIC MATERIALS | 1987年 / 16卷 / 04期
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D O I：
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中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
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页码：A4 / A4
页数：1
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