LASER CHEMICAL VAPOR-DEPOSITION OF METALS AND INSULATORS

被引：33

|

作者：

ALLEN, SD

BASS, M

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1979年 / 16卷 / 02期

关键词：

D O I：

10.1116/1.569967

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：431 / 431

页数：1

相关论文

共 50 条

[21] LASER CHEMICAL VAPOR-DEPOSITION - A TECHNIQUE FOR SELECTIVE AREA DEPOSITION
ALLEN, SD
JOURNAL OF APPLIED PHYSICS, 1981, 52 (11) : 6501 - 6505
[22] CONTROL OF LATERAL EPITAXIAL CHEMICAL VAPOR-DEPOSITION OF SILICON OVER INSULATORS
BRADBURY, DR
KAMINS, TI
TSAO, CW
JOURNAL OF APPLIED PHYSICS, 1984, 55 (02) : 519 - 523
[23] CHEMICAL VAPOR-DEPOSITION
HIROSE, M
SEMICONDUCTORS AND SEMIMETALS, 1984, 21 : 109 - 122
[24] CHEMICAL VAPOR-DEPOSITION
JENSEN, KF
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1986, 192 : 5 - IAEC
[25] CHEMICAL VAPOR-DEPOSITION
JENSEN, KF
ADVANCES IN CHEMISTRY SERIES, 1989, (221): : 199 - 263
[26] CHEMICAL VAPOR-DEPOSITION
ARCHER, NJ
PHYSICS IN TECHNOLOGY, 1979, 10 (04): : 152 - 161
[27] THE DEPOSITION OF INSULATORS ONTO INP USING PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION
WOODWARD, J
CAMERON, DC
IRVING, LD
JONES, GR
THIN SOLID FILMS, 1981, 85 (01) : 61 - 69
[28] BISTABLE GROWTH IN LASER-CHEMICAL VAPOR-DEPOSITION
KARGL, PB
KULLMER, R
BAUERLE, D
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1993, 57 (06): : 577 - 578
[29] LASER CHEMICAL VAPOR-DEPOSITION OF THIN ALUMINUM COATINGS
SHANOV, V
IVANOV, B
POPOV, C
THIN SOLID FILMS, 1992, 207 (1-2) : 71 - 74
[30] LASER-INDUCED CHEMICAL VAPOR-DEPOSITION OF CARBON
LEYENDECKER, G
BAUERLE, D
GEITTNER, P
LYDTIN, H
APPLIED PHYSICS LETTERS, 1981, 39 (11) : 921 - 923

← 1 2 3 4 5 →