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EFFECT OF ZN PARTIAL-PRESSURE DURING GROWTH ON ELECTRICAL-PROPERTIES OF ZNSE CRYSTALS GROWN FROM THE MELT
被引:3
|
作者
:
KIKUMA, I
论文数:
0
引用数:
0
h-index:
0
机构:
Department of Electronics, Ibaraki University, Hitachi, ibaraki
KIKUMA, I
KIKUCHI, A
论文数:
0
引用数:
0
h-index:
0
机构:
Department of Electronics, Ibaraki University, Hitachi, ibaraki
KIKUCHI, A
FURUKOSHI, M
论文数:
0
引用数:
0
h-index:
0
机构:
Department of Electronics, Ibaraki University, Hitachi, ibaraki
FURUKOSHI, M
机构
:
[1]
Department of Electronics, Ibaraki University, Hitachi, ibaraki
来源
:
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS
|
1990年
/ 29卷
/ 11期
关键词
:
Low resistivity;
Melt growth;
Zn partial pressure;
ZnSes;
D O I
:
10.1143/JJAP.29.L1963
中图分类号
:
O59 [应用物理学];
学科分类号
:
摘要
:
This paper describes the melt growth of ZnSe crystals by a modified Bridgman method under argon pressure. A definite Zn partial pressure over the melt is maintained by controlling the temperature of a Zn zeservoir. Electrical properties of as-grown crystals depend on the temperature of the reservoir. Low-resistivity n-type crystals are obtained when the temperature of the reservoir is kept above 1040°C during growth. The resistivity of the crystals is 0.2 to 5 Ω·cm and the Hall mobility is 380 to 500 cm2/V ·s at room temperature (290±5 K). The temperature of the Zn reservoir during the cooling process after solidification also affects the electrical properties. © 1990 IOP Publishing Ltd.
引用
收藏
页码:L1963 / L1965
页数:3
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