FOCUSED ION-BEAM REPAIR - STAINING OF PHOTOMASKS AND RETICLES

被引：3
|
作者：
PREWETT, PD
SUNDARAM, GM
机构：
[1] SERC Rutherford-Appleton Lab, Didcot
来源：
JOURNAL OF PHYSICS D-APPLIED PHYSICS | 1993年 / 26卷 / 07期
关键词：
D O I：
10.1088/0022-3727/26/7/021
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Focused ion beam (FIB) repair of chromium defects on photomasks and reticles leaves a post repair stain in the quartz substrate. The wavelength dependent absorption properties of typical stained regions have been measured, showing transition losses up to 80% in the deep uv. A simple model is in good qualitative agreement with the experimental results.
引用
收藏
页码：1135 / 1137
页数：3
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