FOCUSED ION-BEAM REPAIR - STAINING OF PHOTOMASKS AND RETICLES

被引:3
|
作者
PREWETT, PD
SUNDARAM, GM
机构
[1] SERC Rutherford-Appleton Lab, Didcot
关键词
D O I
10.1088/0022-3727/26/7/021
中图分类号
O59 [应用物理学];
学科分类号
摘要
Focused ion beam (FIB) repair of chromium defects on photomasks and reticles leaves a post repair stain in the quartz substrate. The wavelength dependent absorption properties of typical stained regions have been measured, showing transition losses up to 80% in the deep uv. A simple model is in good qualitative agreement with the experimental results.
引用
收藏
页码:1135 / 1137
页数:3
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