FORMATION OF ULTRATHIN OXIDE-FILMS ON SILICON IN RF OXYGEN PLASMA

被引：13
|
作者：
ATANASOVA, ED
KIROV, KI
KANTARDJEVA, EI
机构：
来源：
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1981年 / 64卷 / 01期
关键词：
D O I：
10.1002/pssa.2210640106
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：73 / 80
页数：8
相关论文
共 50 条
  • [41] STUDIES OF DIFFUSION OF BORON THROUGH SILICON OXIDE-FILMS
    MUKHERJEE, SP
    EVANS, PE
    THIN SOLID FILMS, 1972, 14 (02) : 299 - 303
  • [42] Atomic transport across the interfaces during the formation of ultrathin silicon oxide/nitride/oxide films
    Baumvol, IJR
    Salgado, TDM
    Radtke, C
    Krug, C
    de Andrade, J
    APPLIED PHYSICS LETTERS, 1998, 73 (14) : 1970 - 1972
  • [43] MECHANICAL-STRESS RELAXATION IN OXIDE-FILMS ON SILICON
    SOKOLOV, VI
    FEDOROVICH, NA
    FIZIKA TVERDOGO TELA, 1982, 24 (05): : 1440 - 1441
  • [44] ANALYSIS OF THIN OXIDE-FILMS ON SILICON BY BACKSCATTERING TECHNIQUES
    不详
    INTERNATIONAL JOURNAL OF ELECTRONICS, 1979, 46 (05) : 513 - 520
  • [45] OXIDATION OF ULTRATHIN IRON LAYERS ON CU(100) - COMPOSITION OF THE OXIDE-FILMS
    DENDAAS, H
    GIJZEMAN, OLJ
    GEUS, JW
    SURFACE SCIENCE, 1993, 285 (1-2) : 15 - 26
  • [46] ANODIC EVOLUTION OF OXYGEN ON SPUTTERED IRIDIUM OXIDE-FILMS
    HACKWOOD, S
    SCHIAVONE, LM
    BENI, G
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1981, 128 (03) : C129 - C129
  • [47] Structural control of silicon oxide particles by oxygen partial pressure in RF plasma
    Sato, T
    Takeda, A
    Kimura, Y
    Suzuki, H
    Saito, Y
    Kaito, C
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2003, 42 (9A): : 5896 - 5897
  • [48] ANODIC EVOLUTION OF OXYGEN ON SPUTTERED IRIDIUM OXIDE-FILMS
    HACKWOOD, S
    SCHIAVONE, LM
    DAUTREMONTSMITH, WC
    BENI, G
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1981, 128 (12) : 2569 - 2573
  • [49] STRUCTURE OF ANODIC OXIDE-FILMS ON ALUMINUM - COMPOSITE OXIDE-FILMS
    TAKAHASHI, H
    JOURNAL OF ELECTRON MICROSCOPY, 1990, 39 (02): : 134 - 134
  • [50] SILICON NANOPARTICLE FORMATION IN SI+-IMPLANTED THERMAL OXIDE-FILMS AND VISIBLE PHOTOLUMINESCENCE BEHAVIOR
    SHIMIZUIWAYAMA, T
    NAKAO, S
    SAITOH, K
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1994, 34 : 86 - 88
12345