LOW RESISTANCE CONTACTS TO Y-BA-CU-O THIN-FILMS

被引：2
|
作者：
JIA, QX
ANDERSON, WA
机构：
来源：
JOURNAL OF PHYSICS D-APPLIED PHYSICS | 1989年 / 22卷 / 10期
关键词：
D O I：
10.1088/0022-3727/22/10/027
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：1565 / 1567
页数：3
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