FORMATION OF SM SILICIDES ON SI(111) - COMPOSITION AND EPITAXY

被引：8
|
作者：
WIGREN, C
ANDERSEN, JN
NYHOLM, R
KARLSSON, UO
机构：
[1] LUND UNIV,MAX LAB,S-22100 LUND,SWEDEN
[2] ROYAL INST TECHNOL,DEPT PHYS,S-10044 STOCKHOLM 70,SWEDEN
来源：
SURFACE SCIENCE | 1993年 / 293卷 / 03期
关键词：
D O I：
10.1016/0039-6028(93)90319-F
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
The formation of Sm silicides on Si(111) by means of solid phase epitaxy has been studied with low energy electron diffraction, Auger electron spectroscopy and photoelectron spectroscopy of the Sm 4f level and Si 2p level. A limited reaction is found to occur already at room temperature whereas at higher temperatures a strongly intermixed Sm/Si layer showing some long range order is formed. The Sm atoms of this intermixed phase are found to be completely trivalent in accordance with expectations. The intermixed layer consists of two silicides with different compositions, one of them being SmSi2-x, the other being tentatively ascribed to SmSi.
引用
收藏
页码：254 / 259
页数：6
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