RF POWER ABSORPTION OF A PLASMA PRODUCED BY A COAXIAL PLASMA GUN

被引：0
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作者：
MASUDA, M
TANAKA, Y
OKUDA, T
机构：
来源：
JOURNAL OF PHYSICS D-APPLIED PHYSICS | 1972年 / 5卷 / 09期
关键词：
D O I：
10.1088/0022-3727/5/9/410
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：1558 / &
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