DIFFRACTION OF HE ATOMS AT A SI(100) SURFACE

被引：115

作者：

CARDILLO, MJ

BECKER, GE

机构：

来源：

PHYSICAL REVIEW LETTERS | 1978年 / 40卷 / 17期

关键词：

D O I：

10.1103/PhysRevLett.40.1148

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

引用

页码：1148 / 1151

页数：4

共 14 条

[1]

BOATO G, 1976, J PHYS F MET PHYS, V6, P2237

[2]

CARDILLO M, UNPUBLISHED

[3] Diffraction of molecular beams [J].

Estermann, I. ;

Stern, O. .

ZEITSCHRIFT FUR PHYSIK, 1930, 61 (1-2) :95-125

[4]

GOODMAN FO, 1977, CRC CR REV SOL STATE, V7, P33, DOI 10.1080/10408437708243432

[5]

GREENE EF, UNPUBLISHED

[6] CHARACTERIZATION OF SURFACES BY LOW-ENERGY HELIUM SCATTERING [J].

HORNE, J ;

MILLER, DR .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1976, 13 (01) :351-354

[7] HE-4 ATOMIC-BEAM SCATTERING FROM CLEAN SURFACES OF SILICON AND GERMANIUM [J].

HOUSTON, DE ;

FRANKL, DR .

JOURNAL OF CHEMICAL PHYSICS, 1974, 60 (08) :3268-3270

[8] LOW-ENERGY ELECTRON DIFFRACTION STUDY OF SILICON SURFACE STRUCTURES [J].

LANDER, JJ ;

MORRISON, J .

JOURNAL OF CHEMICAL PHYSICS, 1962, 37 (04) :729-&

[9] DIFFRACTION OF HELIUM FROM AN ORDERED STEPPED SURFACE - CU(117) [J].

LAPUJOULADE, J ;

LEJAY, Y .

SURFACE SCIENCE, 1977, 69 (01) :354-358

[10] OBSERVATIONS OF CLEANED AND OXYGEN EXPOSED SURFACES OF SILICON AND GERMANIUM BY REFLECTION HIGH ENERGY ELECTRON DIFFRACTION [J].

RUSSELL, GJ .

SURFACE SCIENCE, 1970, 19 (01) :217-+

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