RESISTIVE STABILIZATION OF A DISCHARGE-EXCITED XECL-STAR LASER

被引：7

|

作者：

HOGAN, DC

KEARSLEY, AJ

WEBB, CE

机构：

来源：

JOURNAL OF PHYSICS D-APPLIED PHYSICS | 1980年 / 13卷 / 12期

关键词：

D O I：

10.1088/0022-3727/13/12/001

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：L225 / L228

页数：4

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