FACING TARGETS TYPE OF SPUTTERING METHOD FOR DEPOSITION OF MAGNETIC METAL-FILMS AT LOW-TEMPERATURE AND HIGH-RATE

被引：143
|
作者：
NAOE, M
YAMANAKA, SI
HOSHI, Y
机构：
来源：
IEEE TRANSACTIONS ON MAGNETICS | 1980年 / 16卷 / 05期
关键词：
D O I：
10.1109/TMAG.1980.1060683
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：646 / 648
页数：3
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