HILLOCK REDUCTION IN ION-IMPLANTED METAL

被引：4
|
作者：
HOLLAND, OW
ALVIS, JR
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1987年 / 134卷 / 8A期
关键词：
D O I：
10.1149/1.2100810
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：2017 / 2019
页数：3
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