THERMAL-STABILITY OF HYDROGEN IN SILICON-NITRIDE FILMS PREPARED BY ECR PLASMA CVD METHOD

被引：17

作者：

HIRAO, T ^{[1
]}

KAMADA, T ^{[1
]}

KITAGAWA, M ^{[1
]}

SETSUNE, K ^{[1
]}

WASA, K ^{[1
]}

MATSUDA, A ^{[1
]}

TANAKA, K ^{[1
]}

机构：

[1] ELECTROTECH LAB,SAKURA,IBARAKI 305,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1988年 / 27卷 / 04期

关键词：

D O I：

10.1143/JJAP.27.528

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：528 / 533

页数：6

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