DIRECT WRITING OF MO MICROSTRUCTURES USING HIGH BRILLIANCE SYNCHROTRON-RADIATION

被引：0
|
作者：
VATERLEIN, P [1 ]
WUSTENHAGEN, V [1 ]
UMBACH, E [1 ]
机构：
[1] UNIV STUTTGART,INST PHYS 4,D-70550 STUTTGART,GERMANY
来源：
APPLIED PHYSICS LETTERS | 1995年 / 66卷 / 17期
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中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：2200 / 2202
页数：3
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