SURFACE-STATE FORMATION DURING LONG-TERM BIAS-TEMPERATURE STRESS AGING OF THIN SIO2-SI INTERFACES

被引：32
|
作者：
SHIONO, N
YASHIRO, T
机构：
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS | 1979年 / 18卷 / 06期
关键词：
D O I：
10.1143/JJAP.18.1087
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：1087 / 1095
页数：9
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