ION-BEAM SYNTHESIS OF CUBIC FESI2

被引:56
|
作者
DESIMONI, J [1 ]
BERNAS, H [1 ]
BEHAR, M [1 ]
LIN, XW [1 ]
WASHBURN, J [1 ]
LILIENTALWEBER, Z [1 ]
机构
[1] LAWRENCE BERKELEY LAB,BERKELEY,CA 94720
关键词
D O I
10.1063/1.108969
中图分类号
O59 [应用物理学];
学科分类号
摘要
Cubic FeSi2 precipitates were synthesized in Si (100) by room-temperature Fe ion implantation followed by Si 500 keV ion beam induced epitaxial crystallization at 320-degrees-C. High resolution electron microscopy and Rutherford backscattering/channeling techniques show that the cubic precipitates occur in both aligned (A) and twinned (B) types with a lattice parameter very similar to that of the Si ( 100) matrix.
引用
收藏
页码:306 / 308
页数:3
相关论文
共 50 条
  • [1] ION-BEAM SYNTHESIS OF BURIED EPITAXIAL FESI2
    RADERMACHER, K
    MANTL, S
    APETZ, R
    DIEKER, C
    LUTH, H
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1992, 12 (1-2): : 115 - 118
  • [2] ION-BEAM SYNTHESIS OF ALPHA AND BETA FESI2 LAYERS
    HUNT, TD
    SEALY, BJ
    REESON, KJ
    GWILLIAM, RM
    HOMEWOOD, KP
    WILSON, RJ
    MEEKISON, CD
    BOOKER, GR
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1993, 74 (1-2): : 60 - 64
  • [3] ION-BEAM SYNTHESIS OF BURIED FESI2 IN (100) SILICON
    PANKNIN, D
    WIESER, E
    GROETZSCHEL, R
    SKORUPA, W
    BAITHER, D
    BARTSCH, H
    QUERNER, G
    DANZIG, A
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1992, 12 (1-2): : 119 - 122
  • [4] Ion beam synthesis of β-FeSi2
    Daraktchieva, V
    Baleva, M
    Goranova, E
    Angelov, C
    VACUUM, 2000, 58 (2-3) : 415 - 419
  • [5] β-FeSi2 in (111)Si and in (001) Si formed by ion-beam synthesis
    Oostra, D.J.
    Bulle-Lieuwma, C.W.T.
    Vandenhoudt, D.E.W.
    Felten, F.
    Jans, J.C.
    Journal of Applied Physics, 1993, 74 (07)
  • [6] Pulsed ion-beam synthesis of β-FeSi2 precipitate layers in Si(100)
    Batalov, RI
    Bayazitov, RM
    Khaibullin, IB
    Terukov, EI
    Kudoyarova, VK
    NANOTECHNOLOGY, 2001, 12 (04) : 409 - 412
  • [7] Determination of silicon vacancy in ion-beam synthesized β-FeSi2
    Maeda, Y.
    Ichikawa, T.
    Jonishi, T.
    Narumi, M.
    ASIA-PACIFIC CONFERENCE ON SEMICONDUCTING SILICIDES SCIENCE AND TECHNOLOGY TOWARDS SUSTAINABLE OPTOELECTRONICS (APAC-SILICIDE 2010), 2011, 11 : 83 - 86
  • [8] TEM INVESTIGATION OF ION-BEAM SYNTHESIZED SEMICONDUCTING FESI2
    YANG, Z
    HOMEWOOD, KP
    REESON, KJ
    FINNEY, MS
    HARRY, MA
    MATERIALS LETTERS, 1995, 23 (4-6) : 215 - 220
  • [9] Synthesis of amorphous FeSi2 by ion beam mixing
    Milosavljevic, M
    Shao, G
    Bibic, N
    McKinty, CN
    Jeynes, C
    Homewood, KP
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2002, 188 : 166 - 169
  • [10] ORDER DOMAIN BOUNDARIES IN ION-BEAM SYNTHESIZED SEMICONDUCTING FESI2 LAYERS
    YANG, Z
    SHAO, G
    HOMEWOOD, KP
    REESON, KJ
    FINNEY, MS
    APPLIED PHYSICS LETTERS, 1995, 67 (05) : 667 - 669